Tungsten oxide electrochromic film for smart glass can be prepared by magnetron sputtering method. In this regard, experts say that when the oxygen to argon ratio is a certain value, the optical modulation range of the electrochromic device is maximized. Then, as the oxygen partial pressure increases, the optical modulation range gradually decreases. But why can the oxygen partial pressure affect the optical modulation range of an electrochromic device?
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This is because W2.9 in the target fails to completely react with oxygen to form a WOx of non-ideal ratio when the oxygen content is too small, and it leads to a decrease in electrode charge loading during the discoloration process, and thereby the electrochromic performance of the prepared film is poor. Conversely, the electrochromic thin film prepared by magnetron sputtering method has too many oxygen vacancies when the oxygen flow rate is too large, which affects the transmission path of Li+, thereby reducing the electrochromic performance of the tungsten oxide film.
