Tungsten oxide nanoparticle ink is a hole-selective interface layer ink based on a colloidal suspension of tungsten oxide nano particles in isopropanol, with average particle size around 12-16 nm. Wherein, tungsten oxide nano particles exhibit high work ding, processability and easy layer formation on hydrophilic as well as hydrophobic substrates.
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It has been reported that tungsten oxide nanoparticle ink is universally applicable in normal and inverted architecture solar cells. And it is used as hole transport layer in printed electronics for slot-dye, spin-coating and doctor blading. Also, WO3 nanoparticle ink can be applied in organic solar cells as hole transparent layer materials by mixing with PEDOT:PSS formulations in order to fine tune electronic and morphological dry layer properties such as conductivity, surface roughness or layer porosity. What should be noted is that the ink should be ultrasonicated and optionally filtered through 0.45 μm PTFE filter prior to application. And its application and film drying should be under the condition of nitrogen or low humidity. Besides, annealing of deposited WO3-x films at 80°C - 120°C is the post-treatment.
