Mo-doping tungsten oxide electrochromic film for new electrochromic window can be prepared by direct current sputtering. In this regard, experts say that it is very important to control the oxygen to argon ratio in the magnetron sputtering process.
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Experts explained that a mixture of oxygen and argon is introduced into the vacuum reaction chamber during the sputtering process. Wherein oxygen is used as a reaction gas and argon is used as a working gas. When argon ions bombard the atoms on the target to make them fly toward the substrate, they react with oxygen in the vacuum chamber to form a new compound that is deposited onto the substrate. The composition of the compound has a great influence on the electrochromic properties, and the most critical factor determining the composition of the compound is the ratio of oxygen to argon. Therefore, the oxygen to argon ratio is a very important factor in the magnetron sputtering process.
