Some experts have carried out XRD analysis on the Ti-doped tungsten oxide electrochromic film prepared at different temperatures. The XRD patterns of Ti-doping WO3 electrochromic film prepared at different temperatures is shown as below. Compared with the XRD diffraction peak of FTO glass substrate (marked as △), it can be found that:
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As the temperature increases, a new diffraction peak (marked as #) appears at 2θ=23.96° and 2θ=34.04° at 300°C. After comparison, it conforms to the JCPDF card 41-0905, corresponding to the (100) and (110) crystal faces of the cubic WO3. When the temperature is raised to 350°C, the intensity of the characteristic peak is enhanced and the degree of crystallization of the film is enhanced. When the crystalline WO3 film is doped with Ti element, the crystal structure changes, and the monoclinic system changes the cubic system. No TiO2 peak was detected in the diffraction pattern, indicating that a small amount of Ti doping did not form independent TiO2 in the film, while the Ti4+ ionic radius (0.0605nm) was similar to the W6+ ionic radius (0.060nm), so the Ti atom replaced part of the W atom to form the substitution solid solution.
