Yellow tungsten oxide, or WO3, is an n-type semiconductor material with a band gap of about 2.5-2.9eV, which can absorb visible light with a wavelength of 410-500nm. In other words, WO3 has a high utilization rate for sunlight, so it is also a type of photochromic material. In this regard, experts have proposed a preparation method of high photoelectric yellow tungsten oxide film, which belongs to the nano new material synthesis field.
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A Method for Preparing High Photoelectricity Yellow Tungsten Oxide Film
Weigh 0.7mmol (NH4)2W04?2H20, dissolved in 30mL deionized water. Add 6mL 3MHCl solution into the obtained liquid dropwise at room temperature with stirring, stir until the white precipitate no longer increases. The molar amount of phosphomolybdic acid is 20% of ammonium tungstate. 1.6mmol (NH4)2C2O4 was added as a structure directing agent, and deionized water was added until the total volume of the solution is 70mL, stirring for 2 hours. The pre-cleaned FTO conductive glass was tilted into the reactor lining. The solution was transferred to a reaction vessel, sealed, placed in a blast drying oven, and hydrothermally reacted at 180°C for 12h, and then naturally cooled to room temperature. The conductive glass was taken out, washed with deionized water, dried in an oven at 60°C, and calcined at 450°C for 2h to obtain a tungsten trioxide film.
