The expert introduced a method for preparing a tungsten trioxide film with high photoelectric property. The preparation method has the advantages of simple process and convenient operation. And the obtained WO3 thin film has good morphology, which is composed of monoclinic tungsten trioxide nanosheets. In a word, the prepared WO3 photoelectric film has high photoelectric performance, so it has wide application prospects.
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In the method, the tungstate is dissolved in water to form a tungstate solution, and then hydrochloric acid and solid heteropoly acid are added to the obtained tungstate solution, and stirred until no precipitation occurs to form a precursor mixture to obtain the precursor. Ammonium oxalate was added as a structure directing agent in the mixed solution. After depositing tungsten trioxide crystals on the FTO substrate by hydrothermal method, the FTO substrate deposited with tungsten trioxide was calcined. And on the FTO substrate, the tungsten trioxide film is prepared.
